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Engineering of microfabricated ion traps and integration of advanced on-chip features

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posted on 2023-06-07, 07:27 authored by Zak David Romaszko, Seokjun Hong, Martin SiegeleMartin Siegele, Reuben Puddy, Foni Raphaël Lebrun-Gallagher, Sebastian WeidtSebastian Weidt, Winfried HensingerWinfried Hensinger
Atomic ions trapped in electromagnetic potentials have long been used for fundamental studies in quantum physics. Over the past two decades, trapped ions have been successfully used to implement technologies such as quantum computing, quantum simulation, atomic clocks, mass spectrometers and quantum sensors. Advanced fabrication techniques, taken from other established or emerging disciplines, are used to create new, reliable ion-trap devices aimed at large-scale integration and compatibility with commercial fabrication. This Technical Review covers the fundamentals of ion trapping before discussing the design of ion traps for the aforementioned applications. We overview the current microfabrication techniques and the various considerations behind the choice of materials and processes. Finally, we discuss current efforts to include advanced, on-chip features in next-generation ion traps.

History

Publication status

  • Published

File Version

  • Accepted version

Journal

Nature Reviews Physics

ISSN

2522-5820

Publisher

Nature Research

Volume

2

Page range

285-299

Department affiliated with

  • Physics and Astronomy Publications

Full text available

  • Yes

Peer reviewed?

  • Yes

Legacy Posted Date

2020-07-08

First Open Access (FOA) Date

2020-11-28

First Compliant Deposit (FCD) Date

2020-07-07

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