Hensinger1302.3781.pdf (11.24 MB)
Fabrication and operation of a two-dimensional ion-trap lattice on a high-voltage microchip
journal contribution
posted on 2023-06-08, 17:00 authored by R C Sterling, H Rattanasonti, Sebastian WeidtSebastian Weidt, K Lake, P Srinivasan, S C Webster, M Kraft, Winfried HensingerWinfried HensingerMicrofabricated ion traps are a major advancement towards scalable quantum computing with trapped ions. The development of more versatile ion-trap designs, in which tailored arrays of ions are positioned in two dimensions above a microfabricated surface, will lead to applications in fields as varied as quantum simulation, metrology and atom–ion interactions. Current surface ion traps often have low trap depths and high heating rates, because of the size of the voltages that can be applied to them, limiting the fidelity of quantum gates. Here we report on a fabrication process that allows for the application of very high voltages to microfabricated devices in general and use this advance to fabricate a two-dimensional ion-trap lattice on a microchip. Our microfabricated architecture allows for reliable trapping of two-dimensional ion lattices, long ion lifetimes, rudimentary shuttling between lattice sites and the ability to deterministically introduce defects into the ion lattice.
Funding
EP/E011136/1; EPSRC
270843; EC
EP/G007276/1; EPSRC
History
Publication status
- Published
File Version
- Accepted version
Journal
Nature CommunicationsISSN
2041-1723Publisher
Nature Publishing GroupExternal DOI
Issue
1Volume
5Article number
a3637Department affiliated with
- Physics and Astronomy Publications
Full text available
- Yes
Peer reviewed?
- Yes
Legacy Posted Date
2014-04-07First Open Access (FOA) Date
2016-03-22First Compliant Deposit (FCD) Date
2016-08-17Usage metrics
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